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光刻机

http://gengwg.blogspot.com/光刻机（英语："Mask Aligner"stepper）是制造* 微机电，光电，二极体大规模集成电路的关键设备。

概要[编辑]
生产集成电路的简要步骤：

利用模版去除晶圆表面的保护膜。
将晶圆浸泡在腐化剂中，失去保护膜的部分被腐蚀掉后形成电路。
用纯水洗净残留在晶圆表面的杂质。
其中光刻机就是利用紫外线通过模版去除晶圆表面的保护膜的设备。

一片晶圆可以制作数十个集成电路，根据模版光刻机分为两种：

模版和晶圆大小一样，模版不动。
模版和集成电路大小一样，模版随光刻机聚焦部分移动。
其中模版随光刻机移动的方式，模版相对光刻机中心位置不变，始终利用聚焦镜头中心部分能得到更高的精度。成为目前的主流。

主要厂商[编辑]
光刻机是生产大规模集成电路的核心设备，制造和维护需要高度的光学和电子工业基础，世界上只有少数厂家掌握。因此光刻机价格昂贵，通常在3，000至5，0000万美元。

ASML
尼康
佳能
欧泰克
上海微电子装备
SUSS
ABM,Inc.
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